Choose the semiconductor material you want to use for the simulation by clicking on one of the available options: Silicon (Si), Germanium (Ge), or Gallium Arsenide (GaAs).
Enter the work function of the metal gate in electron volts (eV). This value affects the flat-band voltage and overall C-V characteristics of the PMOS capacitor.
Provide the electron affinity of the selected semiconductor in eV. This parameter is essential for calculating the flat-band voltage.
Enter the thickness of the oxide layer, tox, in nanometers (nm), and specify the relative permittivity of the oxide, εox.
Use the given formula for Eg to compute the energy bandgap based on the input temperature. This calculation is crucial for determining intrinsic properties of the semiconductor.
Once all the parameters are set, click the "Submit" button to start the simulation. The system will generate the C-V and Q-V curves based on the input parameters.
Examine the generated plots:
Identify different regions of the C-V curve (accumulation, depletion, inversion) and understand their significance in terms of the PMOS capacitor's behavior. Use these observations to gain insights into the device's electrical properties.
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